| 摘要 |
A high frequency source produces ion beams with a large surface area and with a high flux intensity and with any cross-section shape, for example ribbon-shaped, from a selected type of ion. In a tubular plasma container 1 of the same shape as the selected type of ion beam, which is held between a supporting plate 7 and a covering plate 8, plasma excitation can be brought about with a low gas pressure through the electron cyclotron wave resonance, and an adjustable intermediate circuit 5 is positioned between a high frequency generator 4 and a load circuit coil 2, and a uniform magnetic field Bo, which is required for the type of plasma production used, is generated by a pair of Helmholtz coils with a geometric shape which is matched to the shape of the plasma container 1, and in addition in the supporting plate 7 there is arranged an ion-optical ion extraction system 9 which consists of several electrodes and which is matched to the required geometric shape of the ion beam. The plasma production without electrodes in a container with a simple geometric shape makes possible the production of an ion beam with great purity and high intensity, in particular for surface technology and thin film technology. <IMAGE>
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