发明名称 APPROXIMATION PROCESSING SYSTEM FOR PATTERN
摘要 PURPOSE:To obtain a pattern which regenerates more faithfully the features of an original pattern by correcting a error between position information on each extracted part undergone an averaging process and the position information on the original pattern by scattering said errorevenly on a line pattern produced from the position information undergone averaging process and producing an approximate pattern based on the corrected position information. CONSTITUTION:The features of an original pattern are extracted via the broken line approximation of all curvature functions and an approximate error correcting part 4 corrects an approximate curve based on the approximate curve obtained by said extraction of features and the original pattern. In other words, the positions shifts DELTAx and DELTAy are obtained between the end point of the approximate curve and the original pattern. Then these shift values DELTAx and DELTAy obtained at the end point are distributed proportionally in response to the start point and each flexure point. Thus the position of each flexure point is corrected. In such a way, the position correction is carried out, based on the approximate error between the flexure points or intersecting points of approximate curves. Thus it is possible to obtain the approximate curves that regenerate more faithfully the features of the original pattern.
申请公布号 JPS63279374(A) 申请公布日期 1988.11.16
申请号 JP19870113475 申请日期 1987.05.12
申请人 RICOH CO LTD 发明人 OUCHI SATOSHI
分类号 G06T3/00 主分类号 G06T3/00
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