| 摘要 |
PURPOSE:To uniformized the density of plasma in a wide range by disposing a hollow cathode type plasma beam source and plural anode in the same height and providing a base plate holder in a different height from the above-mentioned height. CONSTITUTION:The hollow cathode type plasma beam source 20, electrodes 111 set on permanent magnets 112 and impressed a positive voltage compared to the plasma beam source, and covergence coils 113 constitute plural anodes 11 which are disposed in a vacuum chamber 10. The plasma beam source 20 and anodes 11 are distributed at almost the same height on the wall of the vacuum chamber 10. A base plate holder 14 impressed with a voltage of optional polarity to the plasma beam source 20 is disposed at the different height from the above-mentioned height. In this multi-anode plasma vacuum device, the plasma area 13 is formed in a wide range 12 of circular disk shape of high density. Moreover, active particles are selectively drawn out by changing the voltage impressed to the base plate holder 14. Thus, the treatment of large quantity is carried out in a short period without the damage of sample.
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