| 摘要 |
PURPOSE:To improve the accumulation speed of a sputtering by accumulating a recording layer or a protecting layer by the use of a sputtering device having a cathode constitution on which plural targets can be disposed. CONSTITUTION:In a device on which a material can be accumulated on a substrate 110 according to the sputtering, the sputtering device on which the plural mutually inclined targets 102, 103 to any of a substrate face and other targets 102, 103 is used. Namely, a probability that a sputtering particle pops out in a direction inclined from a direction vertical to a target face is high, so that an electrode lowered to a ground potential is disposed between the targets, an electron or an ion is trapped, thereby, the accumulation speed of the sputtering can be raised.
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