发明名称 METHOD FOR EVALUATING NITRIDATION CONDITION OF SINTERED SILICON NITRIDE BODY OBTAINED BY REACTION SINTERING
摘要 PURPOSE:To easily evaluate the nitridation conditions of a sintered silicon nitride body obtd. by reaction sintering by the correlative relations between the CT values in the respective parts of the sintered silicon nitride body by an industrial x-ray CT scanner as well as the nitridation rates and treatment temps. by a powder X-ray diffraction method. CONSTITUTION:A sample after a calcination treatment for nitridation is subjected to tomography by the industrial X-ray scanner and the CT values are measured by image processing. An increase in the CT value and an increase in the nitridation rate, i.e., an increase in the amt. of the nitride to be formed correspond well to each other if the nitridation rate of the sample at the prescribed treatment temp. is determined by the powder X-ray diffraction method. The nitridation conditions in the respective parts of the sample are, therefore, easily evaluated by measuring the CT values.
申请公布号 JPS63274852(A) 申请公布日期 1988.11.11
申请号 JP19870108398 申请日期 1987.05.01
申请人 TOSHIBA CERAMICS CO LTD 发明人 AIBA YOSHIRO;KUROKI TOMOHITO;YAMASHITA HAJIME;SANO KOJI
分类号 G01N23/04 主分类号 G01N23/04
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