| 摘要 |
PURPOSE:To enhance electrophotographic characteristics, such as electric chargeability, dark decay resistance, and photosensitivity, and resistance to environmental conditions by forming a photoconductive layer composed of a charge retaining layer and a charge generating layer each having superlattice structure. CONSTITUTION:The photoconductive layer 3 is composed of the charge generating layer 6 formed by alternately laminating thin films of 2 kinds of microcrystalline silicons at least one of both containing at least one of C, O, and N, and the charge retaining layer 5 formed by alternately laminating thin films of amorphous silicon containing at least one of C, O, and N, and thin films of microcrystalline silicon, and at least one part of the photoconductive layer 3 continuously changes in concentration of said element near each interlayer of the thin films, thus permitting the obtained photosensitive body to be superior in chargeability, low in residual potential, high in photosensitivity in a wide wavelength region, and superior in environmental resistance. |
