| 摘要 |
PURPOSE:To obtain the titled novolak, containing repeating units expressed by a specific structure, having excellent water and heat resistance, useful as a curing agent for epoxy resins, etc., and suitable as a sealing material for semiconductor elements. CONSTITUTION:The aimed novolak containing repeating units expressed by formula I (R<1> is H, OH group or a group expressed by formula II; R<2> is H or 1-4C alkyl; X is 2-20C monofunctional organic group having fluorine atoms) and derivatives thereof. Furthermore, X is preferably perfluoroalkenyloxy group or fluoroalkyl group and the content of the repeating units expressed by formula I is preferably at least 1wt.% in the novolak.
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