| 摘要 |
PURPOSE:To obtain a surface protective layer capable of retaining corona resistance for a long time by incorporating one of S, Cl, Br, and I in an amorphous carbon film. CONSTITUTION:S is added to form a C-S-C bond in order to diminish double bonds present in the amorphous carbon film, or halogen is introduced as the branch of the double bond to the formula wherein X is halogen, to withdraw electrons present in the double bond to the halogen strong in electric negativity and to strengthen the double bond, thus permitting the surface protective layer enhanced in ozone resistance to be obtained and the obtained amorphous silicon photosensitive body to be stabilized in characteristics against uses for a long time. |
