发明名称 WASHING METHOD FOR ELECTRON BEAM RADIATING ELECTRODE
摘要 PURPOSE:To make it possible to remove any compound agglutinated to an electrode in a short time with no damage to the electrode by washing the contaminated electron beam radiating electrode by chemical etching or electrolytic etching with liquid mainly composed of glyceline, phosphoric acid and water. CONSTITUTION:An electron beam radiating electrode contaminated by extraneous matters is washed by chemical etching or electrolytic etching with liquid mainly composed of glyceline, phosphoric acid and water. Washing liquid composed of a mixture of glyceline, phosphoric acid and water whose volume ratio is about 1:1:1 is applied to chemical etching or electrolytic etching. Accordingly, by conducting etching only, the matters agglutinated to the electrode which is evaporated from a LaB6 cathode can be completely removed in a short time, regardless of a size or shape of the electrode, with no damage to the electrode itself.
申请公布号 JPS63269444(A) 申请公布日期 1988.11.07
申请号 JP19870101882 申请日期 1987.04.27
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 SAKAI TOMOAKI
分类号 H01J37/06;H01L21/027;H01L21/30 主分类号 H01J37/06
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