PROCESS FOR THE PRODUCTION OF DIMENSIONAL STABLE STRUCTURES WITH A HIGH ASPECT PROPORTION IN THE 1 MILLIMICRON REGION AND BELOW FOR MICROELECTRONICS, AND USE OF THIS PROCESS FOR THE PRODUCTION OF X-RAY MASKS
摘要
申请公布号
DE3474367(D1)
申请公布日期
1988.11.03
申请号
DE19843474367
申请日期
1984.07.23
申请人
SIEMENS AKTIENGESELLSCHAFT BERLIN UND MUNCHEN
发明人
SCHNEIDER-GMELCH, BRIGITTE, DIPL.-ING.;MATHUNI, JOSEPH, DR. RER. NAT., DIPL-PHYS.
