PROTECTIVE COATING OF THE TYPE SiCxNyOzHt, OBTAINED BY PLASMA TREATMENT

摘要

The invention concerns a protective coating, a process for protection of substrates by deposition of a continuous and transparent amorphic inorganic film consisting essentially of silicon, carbon, nitrogen, oxygen and hydrogen by means of a plasma. It also concerns a device for implementation of the process comprising a gas-tight enclosure (3) provided with means for injecting gas (1, 2) , means for creating a plasma (4, 5), means for evacuating the gases, and a substrate support.