| 摘要 |
PURPOSE:To enhance the light-shielding performance of an optical black part by installing an auxiliary light-shielding film between a photoelectric converter and a light-shielding film. CONSTITUTION:In a region of an optical black part OB, a light-shielding film SF is formed at the upper part of an output signal lines HS by laying an interlayer insulating film (e.g., a PSG film) IC in between. The light-shielding film SF is composed of, e.g., a third-layer aluminum film AL3. The aluminum film AL3 is formed, e.g., by a sputtering process and its film thickness is to be about 10000Angstrom . In this structure, if an auxiliary light-shielding film SFH is formed between a photoelectric converter PD for a solid-state image sensor and the light-shielding film SF in the optical black part OB, the light-shielding films in the optical black part are of dual structure; a probability that a pinhole to leak the light is produced in an identical part is reduced; if the light-shielding film SFH is constituted by using an aluminum layer AL1 of a lowest layer, the light which creeps into the photoelectric converter PD is reduced as compared with a case where it is constituted by an aluminum film AL2; it is made possible to enhance the light-shielding performance of the optical black part.
|
