| 摘要 |
PURPOSE:To suppress generation of the static electricity of a mask and to decrease sticking of dust by providing a conductive material to the peripheral frame part of a mask support. CONSTITUTION:The mask support 1 is constituted of quartz glass and is internally formed with a patter 2 for prepn. of a semiconductor pattern. The conductive material 3 such as chromium is provided to the periphery of the face of such mask support 1 on which the pattern 2 is formed. Then, the static electricity is hardly generated even if the periphery of the mask support 1 and a plastic case, etc., are brought into friction against each other at the time of putting the mask support 1 into and out of the case. The static electricity to be charged on the mask support 1 is thereby decreased and the dust sticking to the surface of the mask support is decreased as well. |
