| 摘要 |
PURPOSE:To obviate damage of a protective film, a heat insulating layer thereunder, etc., during etching, by a method wherein a protective film in a thermal head is formed of a film of carbon material containing diamond crystal, and a mixed layer composed of containing component matter of the heat insulating layer and said protective film is provided near the interface of the both. CONSTITUTION:A protective film 18 on a heat insulating layer 6 in a thermal head 20 is formed of a film of carbon material containing diamond crystal, and a mixed layer 17 composed of containing component matter of the heat insulating layer 6 and the protective layer 18 is provided near the interface of the both. Since the protective film 18 is chemically and thermally stable, it is strongly resistant to etchant such as fluoric acid and the protective film 18, the heat insulating layer 6, etc., are not adversely affected by the etchant. Further, since the mixed layer 17 acts as a wedge, adhesion of the protective film 18 to the heat insulating layer 6 is excellent. Further, since difference in thermal expansion coefficient between the protective film 18 and the heat insulating layer 6 can be absorbed by the mixed layer 17 the composition thereof is continuously varied, occurrence of heat stress between the protective film 18 and the heat insulating layer 6 can be restrained. |
