| 摘要 |
PURPOSE:To form a superconductive thin film on the surface of a substrate by applying the negative bias voltage to a holder and eroding cathodes made of the group IIIa, group IIa and group Ib metals or their alloys by the vacuum arc discharge. CONSTITUTION:An arc is ignited across a trigger electrode 7 and cathodes 1-3 by the inductance component of a feeding path, the sufficient energy is applied to the cathodes 1-3 for erosion, the metal vapor made of the group Ib metal, group IIa metal, and group IIIa metal is generated and ionized, and the arc is transferred and continued across the cathodes 1-3 and a vacuum container 4. As a result, the ionized plasma is generated in the oxygen or fluorine gas atmosphere in the vacuum container 4, metal ions and gas molecules are reacted, and a superconductive thin film is formed on the surface of a substrate 10. When the arc current is controlled, the dissolution quantity of the cathodes 1-3 can be adjusted. The element ratios of the group Ib metal, group IIa metal and group IIIa metal of the thin film formed on the surface of the substrate 10 can be thereby adjusted.
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