Organic solvent free developer compositions for lithographic plates having neutral pH comprising a lithium and potassium salt and an anionic surfactant

摘要

An organic solvent free developer composition having a pH in the range of from about 6.5 to about 7.5 comprising in admixture: (a) from about 0.1% to about 20% by weight of the developer of one or more compounds selected from the group consisting of sodium octyl sulfate, sodium tetradecyl sulfate, sodium 2-ethyl hexyl sulfate and ammonium lauryl sulfate; and (b) from about 0.1% to about 30% by weight of the developer of one or more components selected from the group consisting of lithium salts of hydroxy, aryl and alkyl carboxylic acids; and (c) from about 0.1% to about 30% by weight of the developer of one or more compounds selected from the group consisting of potassium salts of hydroxy, aryl and alkyl carboxylic acids; and (d) an optional compatible organic or inorganic acid or base in an amount sufficient to adjust the pH of the developer composition into the range of from about 6.5 to about 7.5; and (e) an optional anti-foam component in an amount of from about 0.02 to about 0.05% by weight of the developer; and (f) sufficient water to formulate an effective developer.