| 摘要 |
PURPOSE:To efficiently generate the cutting mask of a pattern, by tracing and instructing the arbitrary pattern of a pattern original, and computing mask cutting data based on instructed coordinate data, angle data, and magnification data. CONSTITUTION:The pattern original 2 is placed on a pattern original projecting means 1, and next, a sheet of layout design paper 4 is placed on a digitizer 3. Next, an area to be displayed is designated on a display means 34 by which the layout of the pattern is generated, and the pattern projected on the sheet of layout design paper 4 is image-formed. Next, the contour of the projected image of the pattern original 2 is traced on the digitizer 3 by an instructing means, and contour data is cut by inputting to a mask data generating means 33b, and the mask data is computed, and it is stored in an external storage means 5. Next, the numerical value of color magnification data is inputted from an input means 31, and furthermore, an angle of rotation, after being computed, is inputted to the external storage means 5. Next, the cutting mask can be generated automatically by a mask generating means 35.
|
