发明名称 Molecular-beam epitaxy apparatus.
摘要 <p>A vacuum apparatus comprising a substrate setting disc 1 which is arranged in a conveyance chamber and on which substrates are placed, a drive system 34, 19, 21 which drives and rotates the disc 1, a cam 2 which is fixed to the disc 1, switching means 14a - 14d to switch signal circuits through the cam 2, calculation means 37, 43 to receive digital signals generated by the switching operations of the switching means 14a - 14d, signals from the drive system 34, 19, 21 and signals from respective processing devices so as to execute calculations, a memory 42 which registers calculated results, and a display unit 45 which displays the registered contents on a screen, rotational positions of the disc 1 being loaded so as to control the hysteretic aspects of the individual substrates within the conveyance chamber with the substrates at the respective positions and addresses held in correspondence.</p>
申请公布号 EP0287118(A2) 申请公布日期 1988.10.19
申请号 EP19880106059 申请日期 1988.04.15
申请人 HITACHI, LTD. 发明人 TAMURA, NAOYUKI;KANAI, NORIO
分类号 B01J3/02;H01L21/00 主分类号 B01J3/02
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