| 摘要 |
PURPOSE:To efficiently and accurately judge which pattern inside a reticle is being observed, even through observation with a microscope, by a method wherein a pattern indicating a reticle position is arranged in a scribing region. CONSTITUTION:In a structure where semiconductor devices arranged like a matrix and scribing regions to divide the devices are formed on a semiconductor substrate, patterns 1-5 indicating their relative positions are arranged in a scribing region 8. For example, for individual patterns 6 to measure the alignment accuracy the patterns 5 to indicate their relative positions are arranged in left and right positions, in upper and lower positions and in the center by using a figure to indicate the respective positions. These patterns to indicate their relative positions may be arranged not only together with the patterns to measure the alignment accuracy but also together with a pattern to measure a size, the pattern to evaluate the electrical characteristics, or the like. In addition to a method to indicate the patterns by using the figure as in said method, various methods to use a symbol, a combination of the figure and the symbol or the like are available. |
