| 摘要 |
PURPOSE:To contrive to improve the yield of semiconductor devices by a method wherein nonlinear positioning notches are each provided in one place or more on the outer periphery of a circular Si substrate. CONSTITUTION:Semiconductor devices 3 (13) are provided on a substrate 1 (11) for manufacturing semiconductors avoiding a notch 2 for positioning. The range to be damaged by a tweezers 14 on the substrate is the outside of a limiting line (flaw range line) 16 and when the devices 3 are uniformly arranged from the center of the substrate 96 pieces, for example, in number, the number of the devices which become a defective can be confined to 8 pieces shown by broken lines (hatchings) 17 and the yield of the devices is improved than a case where the devices are arranged on the whole surface of the substrate. Moreover, if the forms of the notches are made to differ from each other, it can be prevented to provide a wrong side of the substrate by mistake. |
