| 摘要 |
PURPOSE:To make it possible to conduct a continuous treatment maintaining the load-lock function in each chamber by a method wherein a substrate and an entrance window are integrally formed by a tray, they are transferred through each chamber, and each chamber is separated into a reaction chamber and a light-source chamber, in which ultraviolet rays will be generated, when a thin film is deposited. CONSTITUTION:A cassette type transfer tray 16 is constructed in such a manner that a substrate 17 and a light entrance window 18, made of synthetic quartz, are integrally formed. First, the tray 16 is transferred passing through a gate valve 12 by a chain transfer means, and when they reach the prescribed position, the tray 16 is pressed downward. At this time, a chamber 1 is divided into a reaction chamber A and a light-source chamber B, in a completely airtight manner by the O-ring 26 located at the lower part of the tray 16. Then, SiH4 gas 19 is introduced into the reaction chamber A, and N2 purging gas 20 is introduced into the light source chamber B, a mercury lamp 14 is lighted up and an amorphous silicon film is formed on the substrate 17. After the film has been formed, the above-mentioned gases 19 and 20 are evacuated, the state of pressing of the tray 16 is removed, and the film is transferred to the next chamber passing through a gate valve 13. Through these procedures, a continuous treatment can be conducted maintaining the load lock function of a number of chambers.
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