| 摘要 |
PURPOSE:To enable uniform oxide film formation and diffusion, to solve problems of contamination and to prevent wafers from coming in contact with the outside air when a furnace core tube is inserted by a method wherein the fork, with which the wafer and a boat are put in or taken out, is retained in an inserted state in the furnace core tube, and gas to be used for oxidation and diffusion is fed from a part directly below the wafer and the boat. CONSTITUTION:One end side of a furnace core tube 11 is blocked up, its other end side is opened and besides, a gas exhaust tube 12 is connected to the upper part on one end side. A heater 13 is arranged on the outer circumference of said furnace core tube 11. Also, the fork 14, which is used for taking in and out of the boat carrying a wafer 15, consists of SiC, and it is formed in beltlike plate member. Also, two gas passages 17 are provided in longitudinal direction inside the fork 14, and also a plurality of gas jetting holes 20, which are communicated to each gas passage 17, are formed in two rows on the upper surface of the fork 14 in the prescribed range on the tip where the boat 16 is placed.
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