| 摘要 |
This process consists of etching a substrate perpendicular to its surface in order to form a recess communicating therewith and in which can move laterally the flexible beam, the communication zone representing the image of the gauge to be produced, placing on the substrate surface a mask provided with an opening facing said recess and extending partly over the beam, passing through the opening a particle beam able to form a deposit of piezoresistive material constituting the gauge and electric contacts, said beam being oriented obliquely with respect to the substrate surface, eliminating the mask and producing electrical conductors on the upper and lower faces of the beam in order to supply current to the gauge.
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