TREATMENT OF OBJECT

摘要

PURPOSE:To subject the specific region of an object to a treatment such as film forming or etching without causing film adhesion or etching in a device by effecting a chemical reaction in a limited region so that the resulted product of a reaction is brought into collision against the specific region of the object. CONSTITUTION:The gaseous raw material supplied into an upper stream chamber 3 where a pressure of a specified value or above is maintained is admitted through a reducing and expanding nozzle 1 into a 1st down stream chamber 4a. The above-mentioned gaseous raw material is thereby forced to form a high-velocity beam unified in the progression direction on the down stream side. Such gaseous raw material beam is introduced into the 2nd down stream chamber 4b where an energy beam 7 is projected to said beam to effect the chemical reaction in the limited chemical reaction region 10. The resulted product of reaction formed in such a manner is brought into collision against a base body 6 disposed in the 2nd down stream chamber 4b. The specific region of the base body 6 is thereby efficiently subjected to the film deposition or etching without causing the film adhesion or etching in the chamber 4.