Optical scattering free metal oxide films and methods of making the same

摘要

Optically non-scattering films of titanium dioxide for use in optical elements are prepared by overcoating a non-scattering layer of titanium dioxide with an amorphous layer of silicon dioxide at a temperature which is below the crystallization temperature of the non-scattering film of titanium dioxide. Titanium dioxide and silicon dioxide layers can be deposited by a fusion chemical vapor deposition technique by pyrolytic decomposition of suitable precursors containing the necessary constituents of the respective film layers.