发明名称 PRODUCTION OF TARGET FOR SPUTTERING
摘要 PURPOSE:To produce a target for forming a magnetic thin film having superior magnetic characteristics by melting a specified alloy in vacuum, solidifying the molten alloy in a casting mold in one direction to make an ingot and forging the ingot from the solidification direction to form a fine isometric crystal structure. CONSTITUTION:A magnetic alloy based on at least one among Fe, Ni and Co as magnetic metals is melted in vacuum or in an inert gaseous atmosphere. The molten alloy is poured into a ceramic casting mold and solidified from the top to the bottom in one direction to make an ingot and the upper and lower edges of the ingot are removed by cutting. The resulting ingot consists of uniform columnar crystals having + or -0.1% variation of compsn. in a plane intersecting the solidification direction. The ingot is then forged by pressing from the solidification direction to convert the columnar crystals into fine isometric crystals. By the forging, the ingot is made flat and a target for forming a superior magnetic thin film by sputtering is produced.
申请公布号 JPS63238268(A) 申请公布日期 1988.10.04
申请号 JP19870071487 申请日期 1987.03.27
申请人 HITACHI LTD 发明人 YOSHINARI AKIRA;FUJII NORIHISA;KODAMA HIDEYO;NARUSHIGE SHINJI;MITSUOKA KATSUYA;YOSHIDA TOSHIHIRO
分类号 C23C14/34 主分类号 C23C14/34
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