| 摘要 |
PURPOSE:To form the fine pattern with good accuracy by incorporating a diazonium salt in a polymer contg. a carboxylic group as a pair anion. CONSTITUTION:The pattern is formed by applying a photosensitive resin contg. the diazonium salt of a photobleaching agent on the lower layer of a resist film to form the upper layer of said film, followed by sensitizing both of the upper and lower layers. At this time, the diazonium salt of the pair anion is incorporated in the polymer contg. the carboxylic acid group. Therefore, the A value which is the function of increasing the resolution is increased, and at the same time, the stability of the diazonium salt is improved by dissolving a large amount of the diazonium salt into the titled composition. Thus, the fine resist pattern can be formed with the good stability and resolution. |
