发明名称 SEMICONDUCTOR SUBSTRATE TREATMENT DEVICE
摘要 PURPOSE:To make it possible to discover the cracks of the wafer being treated and the replacement of a carrier by a method wherein the number of substrates in a substrate housing case is counted in front and rear of a treatment device, and the number of substrates counted before and after treatment is compared and checked up. CONSTITUTION:The number of wafers in the carrier 2 set on a loader 1 is counted by a CCD camera 3, and the counted data are sent to a comparating part 9. Then, the number of the wafers in the carrier 2 passed through a treatment part 5 is counted by a CCD camera 7, and it is compared and checked up with the data on the loader 1 by the comparing part 9. Then, when a difference is generated in the number of wafers before and after treatment, the driving of the device is controlled by a controller 4 based on the signal sent from the comparing part 9. As a result, the trouble such as the cracks on the wafer and the replacement of the carrier can be coped with.
申请公布号 JPS63234511(A) 申请公布日期 1988.09.29
申请号 JP19870069753 申请日期 1987.03.24
申请人 NEC KYUSHU LTD 发明人 NONAKA HIROSHI
分类号 H01L21/67;H01L21/02;H01L21/68 主分类号 H01L21/67
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