发明名称 GAS FLOW HOMOGENIZING DEVICE FOR GAS LASER
摘要 PURPOSE:To construct a device capable of fully homogenizing a gas flow by a method wherein an element interfering with the gas flow is placed at the gas discharge side of a gas receiving container. CONSTITUTION:An interference element 7, built of small teflon pieces or teflon fabric, is sandwiched between a top and bottom supporting nets 8a and 8b in a reservoir 3 supplying gas to be discharged from a slit electrode 1b of a gas laser device. In this desgin, in case the reservoir 3 is small is volume, the gas steered in the direction indicated by an arrow B is sufficiently decelerated for the presence of an ample gas flow on the side of the slit electrode 1b and the gas flow on the side of slits 1a is made homogeneous, which prevents dust from entering the gas flow. In another design, the interference element 7 is replaced by baffle plates 6a-6e in the reservoir 3 and a slit plate 9 provided with numerous slits 9a is placed between the slit electrode 1b and the reservoir 3, which homogenizes the gas flow.
申请公布号 JPS63229877(A) 申请公布日期 1988.09.26
申请号 JP19870064926 申请日期 1987.03.19
申请人 KOMATSU LTD 发明人 ITAKURA YASUO;ITOU NORIAKI;FUJIMOTO JUNICHI;TSUCHIYA MITSUO;MATSUNO KIYOO;KOMORI HIROSHI
分类号 H01S3/036;H01S3/097 主分类号 H01S3/036
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