发明名称 HIGHLY REPETITIVE PULSED LASER OSCILLATION DEVICE
摘要 PURPOSE:To maintain the preliminary ionization in an optimum state and to prevent the reduction of the laser output by controlling the outputs of a high-frequency pulse power supply and a main power supply for generating preliminary ionizations on the basis of the value of the discharge load impedance. CONSTITUTION:From a main power supply 5 a voltage is applied between main electrodes 1, 2, whereby a discharge occurs between preliminary ionization electrodes 3a, 3b to generate ultraviolet rays, and on the other hand, a high-frequency, high-voltage pulse train is applied from a high-frequency pulse power supply 11 to pulse preliminary ionization electrodes 10a, 10b, whereby a discharge occurs to generate ultraviolet rays; thus, two preliminary ionizations proceed concurrently. Further, the load impedance of the main discharge space is inputted to an operation control block 12 connected to the high-frequency pulse power supply 11 and the main power supply 5 to control the number of high-frequency pulses applied between the main electrodes 1, 2, whereby an optimum preliminary ionization state is maintained: furthermore the voltage value of the main power supply 5 is controlled to prevent the reduction of the laser output.
申请公布号 JPS63228786(A) 申请公布日期 1988.09.22
申请号 JP19870063259 申请日期 1987.03.18
申请人 TOSHIBA CORP 发明人 TAKAHASHI KENJI;TAMAGAWA TORU;YASUOKA KOICHI
分类号 H01S3/038;H01S3/097;H01S3/0971;H01S3/134 主分类号 H01S3/038
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