| 摘要 |
PURPOSE:To make it possible to treat two samples at the same time, by utilizing both ECR points provided in a pair of electromagnets, and generating plasma in each of two plasma generating chambers. CONSTITUTION:First and second plasma parts 11 and 31 are generated in first and second plasma generating chambers 1 and 3 in correspondence with ECR points 8a and 8b. The intensity of a magnetic field 5, which is generated by a pair of electromagnets 5 has a peak at the intermediate point between the two plasma generating chambers 1 and 3. The intensity is decreased toward samples 21 and 41 from the two ECR points 8a and 8b. Then, electrons flow toward the sample 21 from one ECR point 8b. Electrons flow toward the sample 41 from the other ECR point 8a. Because of the streams of these electrons, ECR ion showers 12 and 31 in the first and second plasma generating chambers 1 and 3 flow toward the samples 21 and 41 in the treating chambers 2 and 4. Specified treatments for the samples 21 and 41 in the chambers 2 and 4 are performed by said ECR ion showers 12 and 32.
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