| 摘要 |
PURPOSE:To enhance the utilizing efficiency of light and to increase a reacting speed, by projecting the light, which is emitted from a light source, on the surface of a sample or reacting gas one time or more. CONSTITUTION:Light, which is emitted from a light source 10, is inputted in a reacting container 20 through a quartz window 21, and reacting gas HCl in the reacting container is excited. The excited HCl etches the silicon in a sample 30. The light, which has excited the HCl once, passes a quartz window 21 and hits a reflecting mirror 40. The light is reflected by the mirror and inputted in the reacting container 20 again through the quartz window 21. The HCl is excited again. The angle of the reflecting mirror with respect to the incident light is adjusted. When many reflecting mirrors are provided, the light can be made to pass many times in the reacting container. The same light can be used for optical excitation for many times. Thus the utilization efficiency is increased, and the reaction speed can be enhanced.
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