发明名称 |
METHOD OF MANUFACTURING PHOTOMASK AND PHOTO-MASK MANUFACTURED THEREBY |
摘要 |
A method of manufacturing a photo-mask, which includes the steps of applying a resist film (3) onto a substrate (1) of quartz, glass and the like, subjecting the resist film (3) to light exposure and development to form a fine resist pattern (4), etching the mask substrate (1) covered by the fine resist pattern (4) so as to cause a non-light transmitting thin film (2) of Cr, Ta, etc. to adhere thereon by vapor deposition, sputtering and the like, and removing the thin film (2) on the resist pattern (4) together with the resist film (3), thereby to form the photo-mask. The disclosure is also directed to a photo-mask manufactured by the above method. |
申请公布号 |
EP0234547(A3) |
申请公布日期 |
1988.09.21 |
申请号 |
EP19870102561 |
申请日期 |
1987.02.24 |
申请人 |
SHARP KABUSHIKI KAISHA |
发明人 |
HIROKANE, JUNJI;KATAYAMA, HIROYUKI;TAKAHASHI, AKIRA;INUI, TETSUYA;OHTA, KENJI;WASHO, JUNICHI;MIYAKE, TOMOYUKI;VAN, KAZUO;MIEDA, MICHINOBU |
分类号 |
G03F1/00;G03F1/54;G03F1/68;G11B7/26 |
主分类号 |
G03F1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|