INSTRUMENT FOR MEASURING FINE PARTICLE

摘要

PURPOSE:To permit measurement of the implantation quantity of fine particles by providing an ionization means which can ionize neutral particles on an upper stream side where the neutral particles advance into a Faraday measuring system. CONSTITUTION:A neutral particle beam 9 shot from a shooting device G passes a mask 8 and enters an ionization electrode 6. The electrons of the beam 9 are stripped to the electron 6 biased positive by a bias power source 7 so that the beam 9 is converted to an ion beam. The ion beam is measured by the integrator 2 in an implantation quantity measuring system of an ion implantation device currently widely used for impurity doping, i.e., the Faraday measuring system 10. The measurement of the implantation quantity of the fine particles is thereby permitted.