发明名称 |
Semiconductor vapor phase growing apparatus |
摘要 |
An apparatus for positioning a plurality of semiconductor substrates on a movable, support in a desired pattern, in a semiconductor vapor phase growing apparatus. A memory is provided for storing two dimensional data corresponding to the desired pattern. The desired pattern is predetermined by the sizes of the substrates and the space available on the flat support. A loading/unloading device loads and unloads the substrates on the support at positions corresponding to the two-dimensional data read from the memory. A positioning device positions the support so that the substrates can be loaded and unloaded at the predetermined positions. A control device synchronizes the movement of the loading/unloading device and the positioning device in accordance with the selected position so that the substrates are loaded and unloaded on the flat support in the desired pattern.
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申请公布号 |
US4770121(A) |
申请公布日期 |
1988.09.13 |
申请号 |
US19870011423 |
申请日期 |
1987.02.03 |
申请人 |
TOSHIBA KIKAI KABUSHIKI KAISHA |
发明人 |
EBATA, HITOSHI;KOMIYAMA, YOSHIZO |
分类号 |
H01L21/205;C23C16/54;H01L21/677;H01L21/68;(IPC1-7):C23C16/00 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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