发明名称 |
SEMICONDUCTOR INTEGRATED CIRCUIT |
摘要 |
PURPOSE:To omit a diode for surge protection and to decrease a terminal forming region by a method wherein a P-channel MOSFET for an unused output circuit and an N-channel MOSFET are each subjected to mask modification for diode connection. CONSTITUTION:The common drain connection part of a CMOS inverter in a non-conductive state is coupled between an input terminal 1 and an input gate circuit and each gate electrode of a P-channel MOSFET for an output circuit and an N-channel MOSFET, which are formed in the CMOS inverter in a non-conductive state, is connected to each one's source part and the source parts are each connected to the potential point of a power source VDD and an earth potential point. By this constitution, the source and drain parts of the MOSFET 7 form a P-N junction between the source and drain parts and the potential of the power source VDD, the source and drain parts of the MOSFET 8 form an N-P junction between the source and drain parts and the earth potential and the P N and N-P junctions respectively act as a diode. |
申请公布号 |
JPS63219153(A) |
申请公布日期 |
1988.09.12 |
申请号 |
JP19870052554 |
申请日期 |
1987.03.06 |
申请人 |
MATSUSHITA ELECTRONICS CORP |
发明人 |
MEN KIYOSHI;MATSUSHIMA MINORU |
分类号 |
H01L27/04;H01L21/822;H01L21/8238;H01L27/02;H01L27/092;H01L29/78 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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