发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 PURPOSE:To omit a diode for surge protection and to decrease a terminal forming region by a method wherein a P-channel MOSFET for an unused output circuit and an N-channel MOSFET are each subjected to mask modification for diode connection. CONSTITUTION:The common drain connection part of a CMOS inverter in a non-conductive state is coupled between an input terminal 1 and an input gate circuit and each gate electrode of a P-channel MOSFET for an output circuit and an N-channel MOSFET, which are formed in the CMOS inverter in a non-conductive state, is connected to each one's source part and the source parts are each connected to the potential point of a power source VDD and an earth potential point. By this constitution, the source and drain parts of the MOSFET 7 form a P-N junction between the source and drain parts and the potential of the power source VDD, the source and drain parts of the MOSFET 8 form an N-P junction between the source and drain parts and the earth potential and the P N and N-P junctions respectively act as a diode.
申请公布号 JPS63219153(A) 申请公布日期 1988.09.12
申请号 JP19870052554 申请日期 1987.03.06
申请人 MATSUSHITA ELECTRONICS CORP 发明人 MEN KIYOSHI;MATSUSHIMA MINORU
分类号 H01L27/04;H01L21/822;H01L21/8238;H01L27/02;H01L27/092;H01L29/78 主分类号 H01L27/04
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