发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To obtain a photosensitive compsn. suitable for a planographic printing plate having superior resistance to treating chemicals, high sensitivity and a wide development latitude by incorporating a specified compd. and a polymer having units each having a phenolic OH group in the molecule. CONSTITUTION:This photosensitive compsn. contains a compd. having a structure represented by the formula (where each of R1 and R2 is H, halogen atom, alkyl, aryl, carboxyl or a salt thereof, R3 is H, halogen atom, alkyl aryl or aralkyl, Y is bivalent (substd.) arom. group, X is a bivalent org. group and n=0-5) and a polymer having units each having a phenolic OH group in the molecular structure. A photosensitive planographic printing plate using the photosensitive compsn. has superior resistance to treating chemicals, especially a plate cleaner and a detergent soln. used in printing with UV ink, a wide development latitude, superior over-developability and under-developability. The compsn. is especially suitable for a positive type photosensitive planographic printing plate.
申请公布号 JPS63214747(A) 申请公布日期 1988.09.07
申请号 JP19870048524 申请日期 1987.03.03
申请人 KONICA CORP;MITSUBISHI KASEI CORP 发明人 YAMAMOTO TAKESHI;GOTO SEI;TOMIYASU HIROSHI;KOBAYASHI YOSHIKO
分类号 G03C1/72;G03F7/022;G03F7/023 主分类号 G03C1/72
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