发明名称 PRODUCTION OF GASEOUS SILANE
摘要 PURPOSE:To produce gaseous silane with high controllability of reaction and in high yield, by carrying out a disproportionation reaction of trialkoxysilane in gaseous phase using an oxide of a lanthanoid metal of the group V or VI of the periodic table as catalyst. CONSTITUTION:Gaseous silane is obtd. by carrying out a disproportionation reaction of trialkoxysilane (e.g. trimethoxysilane) expressed by the formula (wherein R<1>, R<2>, R<3> are 1-3C alkyl) in gaseous phase using an oxide of a lanthanoid metal of the group V or VI of the periodic table as catalyst, at 100-500 deg.C. Specific examples for the oxide of the metal of the group V are zirconium oxide, ruthenium oxide, etc. and a specific example for the oxide of the metal of the group VI is cerium oxide. By this constitution, the reaction can be easily controlled, particularly, the reaction can be stopped easily at emergency.
申请公布号 JPS63210012(A) 申请公布日期 1988.08.31
申请号 JP19870043700 申请日期 1987.02.26
申请人 CHISSO CORP 发明人 INABA SHINICHI;NAGAHAMA HIDEKI
分类号 B01J23/46;B01J21/06;B01J23/10;C01B33/04 主分类号 B01J23/46
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