Device for nondestructive image production and position-selective surface treatment in focused ion beam systems

摘要

In the case of a device for nondestructive image production and position-selective surface treatment in focused ion beam systems, having an ion source which contains a plurality of types of atoms, but at least one light type of atom and one heavy type of atom, which are used individually depending on the application with the aid of a mass separator, a focused ion beam is produced using the multi-atom ion source and its light atom, which ion beam is passed over the surface of the test item in such a manner that a secondary electron signal is produced at each point on the surface, which secondary electron signal is recorded as a function of the beam position and produces an image of the surface, as a result of which an unambiguous pixel allocation to the surface of the test item is ensured, so that the same beam position and thus the same ion-optic arrangement can be used selectively for the heavy atom, which is required for processing the surface, of the ion source.