<p>Submicron structure fabrication is accomplished by providing vapor chemical erosion of a compound crystal by suppressing the more volatile elements so that the less volatile element is provided with an anti-agglomeration and erosion rate limiting capability which can be followed by subsequent regrowth in the same environment. The erosion is sensitive to crystallographic orientation.</p>
申请公布号
EP0278290(A2)
申请公布日期
1988.08.17
申请号
EP19880100945
申请日期
1988.01.22
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
FOSSUM, ERIC ROY;PETTIT, GEORGE DAVID;WOODALL, JERRY MAC PHERSON;KIRCHNER, PETER DANIEL;WARREN, ALAN CLARK