发明名称 WAFER TRANSFER MECHANISM
摘要 <p>PURPOSE:To improve precision in positioning by a method wherein an atmosphere-side magnet is so driven that it may press a bearing stopper, provided at the middle of a magnet coupling shaft, toward a V-shaped stopper provided in vacuum vessel. CONSTITUTION:When an atmosphere-side magnet 7 is caused to move leftward, the direction of transfer of a wafer 2 is deviated toward left or right, because of the gap between a bearing 5 and bearing 9 in contact with each other. Under the conditions, a bearing stopper 10 abuts against either of the two sides of the V-part of a V-shaped stopper 11. When the atmosphere-side magnet 7 moves leftward further, the bearing stopper 10 goes into contact with the two sides of the V-part of the V-shaped stopper 11, and rests thereon under pressure, when the leftward or rightward deviation of the direction of wafer transfer is corrected and the distance of movement is defined. Accordingly, positioning involving wafer transfer may be accomplished with high precision and repeatability.</p>
申请公布号 JPS63197352(A) 申请公布日期 1988.08.16
申请号 JP19870030607 申请日期 1987.02.12
申请人 SEIKO INSTR & ELECTRONICS LTD 发明人 ANDO KAZUNORI
分类号 H01L21/677;H01L21/68 主分类号 H01L21/677
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