发明名称 APPARATUS FOR FORMING THIN FILM PATTERN
摘要 PURPOSE:To enable a mask to be closely contacted with a substrate by its whole surface and to obviate the need of using a rigid masking material adversely effecting the patterning accuracy, by providing a plurality of fastening means for pressing, at several places, the peripheral region of the mask against the substrate, the mask being shaped such that its peripheral region is spaced from the film forming surface of the substrate. CONSTITUTION:A film forming substrate 2 is disposed in a recess 31 of a holding jig 3. A mask 1 is formed for example of a spring steel having elasticity such as stainless steel and is curved so as to have an approximately spherical shape. The mask 1 is contacted with the film forming surface of the substrate 2 only at the center of its spherical face. The surface of the mask contacted with the substrate is smoothed so as not to damage the film forming surface of the substrate. A plurality of screws 4 each of which has a nut 5 and a washer 6 are arranged around the recess 31. The nuts 5 are then fastened gradually so that the washers 6 urge the peripheral region of the mask spaced from the substrate 2, against the surface of the substrate. Since the mask 1 has elasticity, the central region thereof is also pressed strongly against the surface of the substrate 2 and hence the whole mask is closely contacted with the film forming surface of the substrate.
申请公布号 JPS63194337(A) 申请公布日期 1988.08.11
申请号 JP19870027907 申请日期 1987.02.09
申请人 FUJI ELECTRIC CO LTD 发明人 KURAMOCHI HIDEKI
分类号 H01L21/31;H01L21/205 主分类号 H01L21/31
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