POWER SUPPLY DEVICE OF APPARATUS FOR PRODUCING THIN FILM

摘要

PURPOSE:To suppress generation of arc discharge and to sputter and form a good-quality thin film by only the glow discharge by converting AC of a high frequency to DC by a rectifier circuit and smoothing circuit and supplying the DC via a resistor to a sputtering device as a power supply circuit of the sputtering device. CONSTITUTION:A DC high voltage is impressed between an anode 51 as a material for vapor deposition in a vacuum vessel 35 of the sputtering device 5 and a cathode 52 a target to form the thin film on the surface of the substrate 51 with the material of the target 52 as the anode. The AC of 50-60Hz commercial frequency is boosted by a transformer 2 and is rectified to the pulsating current by the rectifier circuit 3 formed by constituting diodes into a bridge, as the power supply device 1 of this time. The rectified current is converted to the flat DC voltage by the smoothing circuit consisting of a choke coil 41 and a capacitor 42 and thereafter, said voltage is impressed to the anode 51 and the cathode 52 via the resistor 6. Shifting of the glow discharge to the arc discharge is prevented by the presence of the resistor 5, by which the generation of a defect such as pinhole on the thin film on the substrate 51 surface by the arc discharge is prevented.