| 摘要 |
PURPOSE:To execute a heating operation at a desired temperature in such a way that the temperature distribution over the whole area of a semiconductor substrate is made always uniform by a method wherein a temperature-measuring means is scanned optically on the semiconductor substrate and the temperature is measured at least at two points on the substrate. CONSTITUTION:A microcomputer 21, to which an output from a detector 13 as a radiation thermometer is input, is connected to three lamp-control units 22a-22c composed of thyristors or the like; these units transmit each control signal to lamp power supplies 23a-23c. Each lamp power supply feeds the electric power corresponding to each control signal to infrared lamps 4a-4c, 5a-5c. A pair of upper and lower infrared lamps which are situated face to face with each other on an identical radius are turned on or off under the control of an identical control signal. The infrared lamps constitute a heating means; an optical system for temperature-measuring use and the detector 13 constitute a temperature-measuring means; the microcomputer 21 and the detector 13 constitute a temperature-control means. By this setup, it is possible to control the temperature distribution of a semiconductor substrate in real time by using a single temperature-measuring means as desired. |
