| 摘要 |
PURPOSE:To provide the title material with various properties such as high permeability to X-ray, high thermal stability, serviceable strength, excellent thermal conductivity, high cooling down effect, transparency by visible light and optical alignment by naked eyes by a method wherein a CVD diamond thin layer with smooth surface is used as a substrate. CONSTITUTION:A CVD diamond thin film is separated on a silicon wafer substrate. First, the surface of this thin film is smoothly ground. Second, the surface is coated with positive type electron beam resist to be development-etched. Next, an evaporation film of gold and tantalum is evaporated to be lifted off by solvent forming a pattern of X-ray absorbing layer. After writing the pattern, silicon wafer leaving the peripheral part thereof as a frame is melted away to make this masking material. Through these procedures, the thin film and a cast iron sheet heated at 600-850 deg.C are fitted with each other in the hydrogen atmosphere requiring no considerable force to assure high grinding efficiency doing no damage to the thin film. |
