| 摘要 |
PURPOSE:To increase the gamma and sensitivity by incorporating specified cresol-formaldehyde novolak resin and a specified quinonediazido compd. in a specified ratio. CONSTITUTION:This positive type photoresist compsn. contains cresol- formaldehyde novolak resin (A) and 1,2-naphthoquinone-2-diazido-4-sulfonic ester (B) of one or more kinds of benzophenone drives. such as 2,4- dihydroxybenzophenone and 2,3,4-trihydroxybenzophenone in 95/5-80/20wt. ratio of A/B. The novolak resin is obtd. by bringing the cresol mixture of 20/80-45/55wt. ratio of m-cresol/p-cresol into addition condensation with formaldehyde. When the photoresist compsn. is irradiated with UV having 200-300nm wavelength, the gamma and sensitivity are increased. |
