| 摘要 |
PURPOSE:To permit easy detection and recognition of the information on the mask used before the completion of a semiconductor wafer merely by viewing the completed wafer by forming an information recording region to part of the transfer region of the mask. CONSTITUTION:A target forming region 7 for superposition is formed with an 'X' marked target 8 and the information on the defect of a pellet region 5 which the mask itself possesses is recorded in the prescribed margin position thereof. The records are designated as A(1, 2), (4, 2). Namely, the information on all the masks used before the completion of the pattern can be recorded by forming the information recording region to part of the transfer region 10 of the mask. Various sets of the information including the position of a defective pellet occurring in the mask, etc., can, therefore, be read from the records of the information. Various sets of the information such as the position of the defective pellet region are thus easily recognized merely by viewing the semiconductor wafer having the completed pattern. |
