发明名称 MANUFACTURE OF SURFACE ACOUSTIC WAVE ELEMENT
摘要 PURPOSE:To prevent undesired corrosion of the substrate due to acid, alkali or water or the like by coating the surface and the rear face of an Li2B4O7 single crystal substrate by a protecting film and using the acid, alkali or water or the like. CONSTITUTION:An SiO2 film 4 is formed on the surface of the Li2B4O7 single crystal substrate 1 by the RF sputtering method and the rear face is subject to pre-processing by a silane coupling agent, after a polyethylene solution is spin-coated, the polyethylene film 3 is formed by heating and drying the face. An aluminum film is vapor-deposited on the said SiO2 film 4 by the vacuum vapor-deposition method, photo resist is coated on the aluminum face and pre- baked, and exposure is applied by using a mask with the electrode pattern. An alakli solution is used to apply development, rinsed by the water and the said aluminum film is wet-etched by using the etching liquid being the mixture of HNO3 and HCLO4 to form the surface acoustic wave exciting electrode and the photo resist is eliminated by plasma ashing.
申请公布号 JPS63178615(A) 申请公布日期 1988.07.22
申请号 JP19870008999 申请日期 1987.01.20
申请人 SONY CORP 发明人 KANAMARU SHOJI
分类号 H03H3/08 主分类号 H03H3/08
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