| 摘要 |
PURPOSE:To control a temp. of a processing laboratory at an optionally set temp. with high accuracy by supplying a heating medium which is kept at a constant temp. through the heating medium supplying means for heat-exchange chambers located between inside and outside walls of a developing vessel, thereby arranging a control means of chemicals in a heat insulation room. CONSTITUTION:Heat exchange chambers 14e, 14f, and 14g where a heating medium passes are formed between inside and outside walls of a developing vessel 500. Then, even though an outside temp. is higher than a setting temp. of a processing laboratory 10, its temp. of the processing laboratory 10 can be controlled at a desired setting temp. with high accuracy without being affected by various conditions of the outside temp. Then development of each wafer W from the first sheet to the required several sheets is performed without producing the scattering of sensitivity. Further, heat exchange coils 600a, 600b, and 600c for adjusting a temp. of a developing solution are prepared in the heat exchange chamber 14e which controls an atmosphere temp. of the processing laboratory 10. Then s valve and others for controlling chemical materials are arranged in a heat insulation room 603 that is surrounded by insulation members 602 and its insulation room allows the valves 802 and 803 to come in contact with a piping 876 where the heating medium passes. Then the developing solution does not produce the scattering of its temp. |
