发明名称 Thin film transistor and method of making the same.
摘要 <p>A source electrode (12) and a drain electrode (13) are formed apart on an insulating substrate (11), and a semiconductor layer (14) is formed on the szbstrate (11) between the source and drain electrodes (12, 13). An insulating organic molecular film (21) is formed all over the source and drain electrodes (12, 13) and the semiconductor layer (14). Ions are implanted into a selected top surface region of the insulating oganic molecular film (21) corresponding to the semiconductor layer (14), by which chains of molecules in the surface region to form free carbon, providing a conductive gate electrode (22) and the remaining part of the insulating organic molecular film (21) forming a gate insulating film (23).</p>
申请公布号 EP0275075(A2) 申请公布日期 1988.07.20
申请号 EP19880100305 申请日期 1988.01.12
申请人 HOSIDEN ELECTRONICS CO., LTD. 发明人 UKAI, YASUHIRO C/O HOSIDEN ELECTRONICS CO.,LTD.
分类号 H01L27/12;H01L21/312;H01L29/49;H01L29/51;H01L29/78;H01L29/786 主分类号 H01L27/12
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